ResiScope™, HD-KFM and Soft Interaction Control by CSInstruments: 10 decades of electrical range, single-pass surface potential and friction-free quantitative imaging. Available on the Nano-Observer II and as an upgrade via the Galaxy Dual Controller.
Resistance from 10² to 10¹² ohms and current from femtoamperes to microamperes: 10 decades in a single scan, enabled by real-time active gain control and a linear amplifier design.
Smart active current protection prevents tip and sample damage from high current, while the high-impedance, ultra-low-noise amplifier keeps signals stable and clean over long scans.
Topography, resistance, current and PFM acquired together. Compatible with tapping mode / Soft-IC (Soft-ResiScope™), EFM/MFM or KPFM: same probe, same location.
Optimized for solid-state batteries, organic electronics, photovoltaics, semiconductors and 2D materials, including extremely low currents (fA range) on insulating materials and weak conduction pathways.

ResiScope™: full dynamic range preserved on the same sample

Standard C-AFM: saturation in high-conductivity regions
| Criterion | C-AFM | ResiScope™ |
|---|---|---|
| Measurement capability | Current only; resistance inferred indirectly | Simultaneous current and resistance at each pixel, direct quantitative values |
| Dynamic range | Limited; typically nA to µA currents | 10² to 10¹² Ω and fA to µA in one pass |
| Sample compatibility | Higher force or bias risks damage to soft materials | Low-force operation with Soft-ResiScope™ |
| Workflow | Multiple scans or setups needed | Resistance and current in a single scan |
vs SSRM: SSRM typically operates best within a narrow resistance range (often up to only ~10⁶–10⁷ Ω), measures current only, and often requires high applied force. ResiScope™ covers 10² to 10¹² Ω with quantitative values at every pixel, and Soft-ResiScope™ preserves separators and solid electrolytes at significantly lower forces.
Harmonic Detection Kelvin Force Microscopy delivers quantitative surface potential mapping with exceptional sensitivity. Leveraging the cantilever’s second eigenmode, HD-KFM operates at high frequency (~350–400 kHz) and probes extremely close to the sample surface.
Topography and surface potential in one scan, with one click setup powered by an in-built algorithm and enhanced <10 nm resolution for nanoelectronic and material interfaces.
Detection of buried materials and subsurface structures invisible to conventional KFM techniques, with enhanced sensitivity even on non-conductive materials.
EFC enables pure MFM by eliminating unwanted electrostatic (EFM) contributions, and dC/dZ mapping delivers detailed contrast of dielectric variations.
2D materials, composites, semiconductors and metals. Perfect for batteries, semiconductors and functional materials, combined seamlessly with ResiScope™ and Soft-IC.

Topography misses buried nanotubes; HD-KFM reveals sub-surface contrast

Layer-by-layer work function contrast on graphene, 1ML to 4ML
Soft Interaction Control (Soft-IC) bridges the gap between contact mode and resonant mode: friction-free, constant-force, quantitative measurements on samples that conventional scanning would destroy.
Height and mechanical stiffness acquired on contact.
Quantitative electrical, thermal or piezo measurement at fixed load.
Adhesion force captured during the retraction curve.
Zero lateral contact during XY displacement. No friction, no damage.
The stability of contact mode with the sensitivity of resonant techniques, especially effective for soft matter, biomaterials and thin films.
Fully compatible with Soft-MEKA (dielectric mapping), Soft-ResiScope™ (resistivity), Soft-PFM (piezo response) and Soft-SThM (thermal mapping), allowing comprehensive multiphysics analysis without requiring sample conductivity or stiff probes.

The Soft-IC measurement cycle: approach, hold, retract, move
| Measurement need | Standard mode | CSInstruments technology |
|---|---|---|
| Surface potential / work function | Standard KPFM (lift mode) | HD-KFM: single pass, artifact-free, sub-surface sensitivity |
| Local resistance mapping | Basic C-AFM | ResiScope™: 10² to 10¹² Ω in one scan |
| Current imaging on fragile samples | Contact-mode C-AFM | Soft-ResiScope™: gentle on 2D materials and polymers |
| Piezoelectric characterization | Standard PFM | Soft-PFM |
| Thermal mapping on soft samples | Contact-mode SThM | Soft-SThM |
These modes are built into the Nano-Observer II and added to existing AFMs by the Galaxy Dual Controller.
Talk through measurement protocols for your samples, or arrange a demonstration in Singapore with Frontier Scientific.