Advanced AFM Modes

ResiScope™, HD-KFM and Soft Interaction Control by CSInstruments: 10 decades of electrical range, single-pass surface potential and friction-free quantitative imaging. Available on the Nano-Observer II and as an upgrade via the Galaxy Dual Controller.

ResiScope™: Resistance over 10 Decades

ResiScope™ sets a new standard in electrical characterization: high-accuracy resistance and current measurements across an extensive range, with intelligent, real-time adaptive electronics delivering artifact-free maps.

Ultra-Wide Dynamic Range

Resistance from 10² to 10¹² ohms and current from femtoamperes to microamperes: 10 decades in a single scan, enabled by real-time active gain control and a linear amplifier design.

Tip & Sample Protection

Smart active current protection prevents tip and sample damage from high current, while the high-impedance, ultra-low-noise amplifier keeps signals stable and clean over long scans.

Simultaneous Mapping

Topography, resistance, current and PFM acquired together. Compatible with tapping mode / Soft-IC (Soft-ResiScope™), EFM/MFM or KPFM: same probe, same location.

Made for Emerging Materials

Optimized for solid-state batteries, organic electronics, photovoltaics, semiconductors and 2D materials, including extremely low currents (fA range) on insulating materials and weak conduction pathways.

ResiScope™: full dynamic range preserved on the same sample

Standard C-AFM: saturation in high-conductivity regions

CriterionC-AFMResiScope™
Measurement capabilityCurrent only; resistance inferred indirectlySimultaneous current and resistance at each pixel, direct quantitative values
Dynamic rangeLimited; typically nA to µA currents10² to 10¹² Ω and fA to µA in one pass
Sample compatibilityHigher force or bias risks damage to soft materialsLow-force operation with Soft-ResiScope™
WorkflowMultiple scans or setups neededResistance and current in a single scan

vs SSRM: SSRM typically operates best within a narrow resistance range (often up to only ~10⁶–10⁷ Ω), measures current only, and often requires high applied force. ResiScope™ covers 10² to 10¹² Ω with quantitative values at every pixel, and Soft-ResiScope™ preserves separators and solid electrolytes at significantly lower forces.

HD-KFM: One Click Harmonic KPFM

Harmonic Detection Kelvin Force Microscopy delivers quantitative surface potential mapping with exceptional sensitivity. Leveraging the cantilever’s second eigenmode, HD-KFM operates at high frequency (~350–400 kHz) and probes extremely close to the sample surface.

Single Pass, No Lift Artifacts

Topography and surface potential in one scan, with one click setup powered by an in-built algorithm and enhanced <10 nm resolution for nanoelectronic and material interfaces.

Sub-Surface Sensitivity

Detection of buried materials and subsurface structures invisible to conventional KFM techniques, with enhanced sensitivity even on non-conductive materials.

Electric Field Cancelling (EFC)

EFC enables pure MFM by eliminating unwanted electrostatic (EFM) contributions, and dC/dZ mapping delivers detailed contrast of dielectric variations.

Universal Material Compatibility

2D materials, composites, semiconductors and metals. Perfect for batteries, semiconductors and functional materials, combined seamlessly with ResiScope™ and Soft-IC.

Topography misses buried nanotubes; HD-KFM reveals sub-surface contrast

Layer-by-layer work function contrast on graphene, 1ML to 4ML

Soft Interaction Control: The Third AFM Mode

Soft Interaction Control (Soft-IC) bridges the gap between contact mode and resonant mode: friction-free, constant-force, quantitative measurements on samples that conventional scanning would destroy.

1. Approach

Height and mechanical stiffness acquired on contact.

2. Constant Force Hold

Quantitative electrical, thermal or piezo measurement at fixed load.

3. Retract

Adhesion force captured during the retraction curve.

4. Move to Next Point

Zero lateral contact during XY displacement. No friction, no damage.

  • Hybrid of contact and resonant modes

    The stability of contact mode with the sensitivity of resonant techniques, especially effective for soft matter, biomaterials and thin films.

  • Versatile platform

    Fully compatible with Soft-MEKA (dielectric mapping), Soft-ResiScope™ (resistivity), Soft-PFM (piezo response) and Soft-SThM (thermal mapping), allowing comprehensive multiphysics analysis without requiring sample conductivity or stiff probes.

The Soft-IC measurement cycle: approach, hold, retract, move

Choosing the Right Mode

Measurement needStandard modeCSInstruments technology
Surface potential / work functionStandard KPFM (lift mode)HD-KFM: single pass, artifact-free, sub-surface sensitivity
Local resistance mappingBasic C-AFMResiScope™: 10² to 10¹² Ω in one scan
Current imaging on fragile samplesContact-mode C-AFMSoft-ResiScope™: gentle on 2D materials and polymers
Piezoelectric characterizationStandard PFMSoft-PFM
Thermal mapping on soft samplesContact-mode SThMSoft-SThM

These modes are built into the Nano-Observer II and added to existing AFMs by the Galaxy Dual Controller.

Discuss Your Application

Talk through measurement protocols for your samples, or arrange a demonstration in Singapore with Frontier Scientific.